Advancing Precision in Cutting-Edge Technology
semiconductor manufacturing
Silica quartz plays a critical role in semiconductor manufacturing processes as a key component in the production of silicon wafers. Silicon wafers are used as substrates for fabricating integrated circuits and other semiconductor devices. The high purity and controlled crystal structure of silica quartz ensure the reliability and performance of semiconductor components in electronic devices.
Detailed Specifications
- Ultra-high purity silica quartz with minimal impurities to meet stringent semiconductor manufacturing standards.
- Consistent crystal structure and surface quality for uniformity and reliability in silicon wafer production.
- Low levels of dopants and defects to ensure optimal electrical properties and device performance.
- Precise dimensional control for wafer thickness and flatness requirements.
- Excellent thermal conductivity and stability for efficient heat dissipation and device reliability.
Application:
- Telecommunications: Facilitating seamless communication networks through advanced devices and infrastructure.
- Healthcare: Enhancing medical diagnostics, treatments, and patient care with state-of-the-art equipment and technologies.
- Transportation: Improving efficiency, safety, and sustainability in vehicles and transportation systems.
- Manufacturing: Optimizing production processes with automation, robotics, and precision engineering.
Benefits:
Innovation: Driving technological advancements and fostering continuous improvement in various industries.
Efficiency: Enhancing productivity and reducing operational costs through automation and optimization.
Quality: Improving product reliability, performance, and consistency to meet and exceed consumer expectations.
Sustainability: Promoting environmental stewardship and resource conservation through efficient technologies and practices.
| Elements | Composition |
| Silicon Dioxide (SiO2): | ≥ 99.5% - 99.98% |
| Alumina (Al2O3): | ≤ 0.1% |
| Iron Oxide (Fe2O3): | ≤ 0.02% |
| Sodium Oxide (Na2O): | ≤ 0.01% |
| Potassium Oxide (K2O): | ≤ 0.01% |
| Boron Oxide (B2O3): | ≤ 0.01% |
| Phosphorus Pentoxide (P2O5): | ≤ 0.01% |
